CNR - ISMN
Laboratory of Growth of thin films by Chemical Vapour Deposition techniques

Articles

Plasma Enhanced Chemical Vapour Deposition (PECVD) Apparatus for carbon-based (Diamond-Like Carbon based) thin films deposition and modification of surface properties of organic/inorganic substrates via plasma.

Power generator 13,500 MHZ, 250W, matching network

Gas Lines: Argon, Nitrogen, Hydrogen, Oxygen and Methane

Bubbler line for metal organic precursors

Heating up to 200°C

Pre-Chamber for samples treatments

The home made Plasma Enhanced Chemical Vapour Deposition (PECVD) apparatus consists of capacitively coupled asymmetric plasma reactor, driven by 13.56 MHz RF power generator connected to the upper electrode and controlled by an integrated impedance matching network. The max applicable power is 300W. The lower electrode can be heated up to 300°C, through quartz lamps and the temperature could be controlled by a thermocouple. The gases source (CH4, H2, Ar, N2 and from a separate line O2) were uniformly distributed in the reactive chamber by a showerhead type distributor, placed in contact with the upper electrode. A dedicated line for liquid metallorganic precursor evaporation is independently connected to the reactive chamber, with a Ar gas carrier.

Metal Organic Chemical Vapor Deposition (MOCVD) Cold Wall Reactor for the deposition of metal oxide based thin films (TiO2, SnO, TixSnyO)

Gas lines: Oxygen, Nitrogen

Bubbler Lines: Titanium Isopropoxide, Tin Butoxide, Zirconium Butoxide

Heating up to 800°C

Pre-Chamber for samples treatments

The prototypal Metal Organic Chemical Vapour Deposition (MOCVD) consists of a deposition chamber and a pre-chamber for the treatment of the sample. The holder can be healed up to 800°C. Oxygen as reactive gas and nitrogen are the gas sources, while actually the bubbler lines are combined for the following metallorganic precursors: titanium isopropoxide, tin butoxide and zirconium butoxide.

Contacts:
Daniela Caschera, This email address is being protected from spambots. You need JavaScript enabled to view it.;
Roberta Grazia Toro, This email address is being protected from spambots. You need JavaScript enabled to view it.

 

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